Fused Silica
Fused Silica is manufactured inside a clean room with the following steps: Through fire hydrolysis of SiCl4 within a hydrogen gas flame, SiO2 nanoparticles of highest purity are formed. These are deposited on a rotating substrate rod with the help of multiple burners. After several hours, a chalk-like, nanoporous bulk develops. After creation, the bulk is optionally dried in a dehydrogenising furnace to remove hydroxyl groups that form during the deposition process. Finally, the soot body is consolidated inside a furnace to receive the transparent glass.
- Transmission range: 0.2-2 µm
- Parallelism: 3 arcminutes
- Planarity: 1 wavelength at 633 nm
- Surface quality: 40/20
- Bakeable up to 200 °C (392 °F)
